• DocumentCode
    2441705
  • Title

    Plasma density measurements in agressive etching gas environment

  • Author

    Ganachev, Ivan P. ; Nakamura, Keiji ; Sugai, Hideo

  • Author_Institution
    Shibaura Mechatron. Corp., Yokohama
  • fYear
    2008
  • fDate
    15-19 June 2008
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Plasma density measurement in fluorocarbon and other aggressive etching gases cannot be easily performed by standard Langmuir probe techniques because of the building of non-conducting films on the probe surface. A new technique free of this problem is the surface-wave (SW) probe, a coaxial-cable-fed pin antenna protected by a dielectric tube around it and connected to a microwave network analyzer. Such a probe features characteristic absorption frequencies manifesting themselves as sharp minima of the reflected microwave power. The absorption peaks have been shown to occur when the electron density of the plasma surrounding the probe is close to the surface-wave resonance plasma density nc(1+epsivd), where epsivd is the dielectric constant of the tube protecting the probe and nc = f2/Fp is the cut-off plasma density related to the microwave frequency/via the proportionality constant Fp ap 81 m-3Hz-2. Thus the order of the plasma density can be directly estimated from the absorption peak frequency f as ne ap (1+epsivd)(f2/Fp), with further corrections roughly accounting for the antenna length and surface-wave dispersion in quasi- static approximation. In this contribution we tested the underlying theory by going beyond the approximate quasi-static estimates. The probe absorption spectrum was computed by means of a finite-difference electromagnetic field solver. The absorption frequencies computed were found to differ up to 30% from the ones obtained in quasi-static approximation as in Kokura et al. (1999). This difference can usually be tolerated, although it has to be taken into account when higher accuracy is sought. The SW probe operates even after deposition of some dielectric films or some etching of the protecting tube, but the effect on the measurement accuracy has been not studied up to now. Finite difference computat- - ions showed a 1-2% increase of the absorption frequency when the thickness of the protecting quartz tube of 4 mm inner diameter is reduced to 0.6 mm from an initial thickness of 1 mm. This result was further confirmed by using a probe exposed for 5.5 hours to HF plasma which resulted in tube thickness reduction by 0.4 mm and absorption frequency shift in agreement with the theory. Thus we conclude that SW probe measurements are not sensitive to erosion of the protective dielectric up to half the initial thickness. The authors acknowledge valuable help from T Ohkawara and T Yamashita.
  • Keywords
    electron density; etching; fluorine compounds; plasma density; plasma electromagnetic wave propagation; plasma probes; Langmuir probe technique; absorption peak frequency; aggressive etching gas; coaxial-cable-fed pin antenna; dielectric tube; electron density; finite-difference electromagnetic field solver; fluorocarbon; microwave frequency; microwave network analyzer; nonconducting films; surface-wave probe; surface-wave resonance plasma density; Density measurement; Dielectric measurements; Electromagnetic wave absorption; Etching; Frequency; Plasma applications; Plasma density; Plasma measurements; Probes; Protection;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
  • Conference_Location
    Karlsruhe
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-1929-6
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2008.4591018
  • Filename
    4591018