DocumentCode
2442305
Title
Free standing plasma in a bifocal microwave concentrator
Author
Schweitzer, Ulrich ; Schultz, Andreas ; Walker, Matthias ; Stroth, Ulrich ; Alberts, Lukas ; Kaiser, Mathias ; Hunyar, Christian ; Graf, Matthias ; Räuchle, Eberhard
Author_Institution
IPF, Univ. Stuttgart, Stuttgart
fYear
2008
fDate
15-19 June 2008
Firstpage
1
Lastpage
1
Abstract
Summary form only given. Low pressure plasma reactors usually suffer from contamination of their plasma generating device. We designed a "remote", electrode less, free standing plasma source which is linearly extendable. Using a bifocal geometry for the microwave cavity we disconnect the plasma treatment area from the plasma generator location. This bifocal geometry has a big influence on the microwave field distribution and plasma homogeneity as demonstrated in a large (3 m) reactor. The homogeneous field distribution can be reached in a "microwave concentrator stack" concept. Over a wide range of gas pressure a homogeneous free standing plasma can be sustained. Technical add-ons in the microwave power supply, like phase locking, allows an easy extension of this linear plasma source.
Keywords
microwave devices; plasma sources; bifocal geometry; bifocal microwave concentrator; free standing plasma source; low pressure plasma reactors; microwave cavity; microwave field distribution; microwave power supply; phase locking; plasma homogeneity; plasma treatment; Contamination; Electrodes; Geometry; Inductors; Microwave devices; Microwave generation; Plasma density; Plasma devices; Plasma simulation; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location
Karlsruhe
ISSN
0730-9244
Print_ISBN
978-1-4244-1929-6
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2008.4591051
Filename
4591051
Link To Document