DocumentCode
2442360
Title
A process and deep level evaluation tool: afterpulsing in avalanche junctions
Author
Giudice, A.C. ; Ghioni, M. ; Cova, S. ; Zappa, F.
Author_Institution
Politecnico di Milano, Italy
fYear
2003
fDate
16-18 Sept. 2003
Firstpage
347
Lastpage
350
Abstract
A technique for a separate experimental characterization of generation centres and deep levels in junctions is presented. The test device required is a small junction that operates in Geiger-mode above the breakdown level. Time-resolved measurements of correlated afterpulsing effects are exploited for separating noise contributions due to generation centres and to carrier trapping in deep levels. Release transients down to the nanosecond range are characterised and lifetimes of individual trap levels are measured. Experimental data for devices fabricated with different technologies illustrate the information gained about the efficiency of the fabrication process and in particular of gettering steps.
Keywords
avalanche diodes; deep levels; electron traps; hole traps; semiconductor device measurement; semiconductor device noise; SPAD; above breakdown level Geiger-mode; avalanche diode junction; avalanche junction afterpulsing; correlated afterpulsing effects; deep level carrier trapping; deep level evaluation tool; generation centre noise contributions; gettering steps; process evaluation tool; release transients; single-photon avalanche diodes; trap level lifetime; Avalanche breakdown; Detectors; Diodes; Electric breakdown; Fabrication; Noise generators; Noise level; Optical pulses; Testing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
Conference_Location
Estoril, Portugal
Print_ISBN
0-7803-7999-3
Type
conf
DOI
10.1109/ESSDERC.2003.1256885
Filename
1256885
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