• DocumentCode
    2442477
  • Title

    Scaling impact on analog performance of sub-100nm MOSFETs for mixed mode applications

  • Author

    Garg, Mayank ; Suryagandh, Sushant S. ; Woo, Jason C S

  • Author_Institution
    Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
  • fYear
    2003
  • fDate
    16-18 Sept. 2003
  • Firstpage
    371
  • Lastpage
    374
  • Abstract
    The recent explosion in the demand for mobile telecommunication, computing and multimedia applications has resulted in much interest in system on chip (SOC) applications. In this work, an analysis of the analog characteristics of scaled MOSFETs is presented. An analog performance metric of intrinsic gain, f/sub T/, linearity, and g/sub m//I/sub ds/ ratio is considered. The effect of scaling on various trade-offs is presented It has been shown that while scaling gate length (L/sub g/) improves various trade-offs, scaling oxide thickness (T/sub ox/) and source/drain extension junction depth (X/sub j/) do not impact trade-offs significantly and they can be set by other constraints such as power supply and gate leakage currents.
  • Keywords
    MOSFET; semiconductor device models; 100 nm; MOSFET optimization; analog performance metric; analog performance scaling effects; gate leakage currents; gate length scaling; mixed mode applications; oxide thickness scaling; power supply; scaling trade-offs; source/drain extension junction depth; Computer applications; Explosions; MOSFETs; Measurement; Mobile computing; Multimedia computing; Multimedia systems; Performance gain; System-on-a-chip; Telecommunication computing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
  • Conference_Location
    Estoril, Portugal
  • Print_ISBN
    0-7803-7999-3
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2003.1256891
  • Filename
    1256891