DocumentCode
2443265
Title
Overview of luminescence from MOS tunnel devices
Author
Asli, N. ; Shulekin, A.F. ; Yoder, P.D. ; Vexler, M.I. ; Grekhov, I.V. ; Seegebrecht, P.
Author_Institution
Technische Fakultat, Christian-Albrechts-Univ., Kiel, Germany
fYear
2003
fDate
16-18 Sept. 2003
Firstpage
545
Lastpage
548
Abstract
The physical origin, observation conditions, simulation results and measured spectra of luminescence from MOS structures with a sub-3 nm oxide, are considered. The luminescence from such devices is related to the energetic relaxation of injected hot electrons and reflects the details of interplay between the photon and phonon emission. Measured spectra show the contribution from direct and indirect recombination and intraband optical transitions and are systematically changed by changing the operation conditions. Based on these spectra, it is possible to restore the net emission spectra by eliminating the reabsorption. Luminescence measurements on MOS tunnel structures are usable for oxide degradation tests if screening the recorded spectrum with the reference spectra.
Keywords
MIS structures; electroluminescence; electron-hole recombination; hot carriers; phonons; tunnelling; 3 nm; MOS tunnel device luminescence; MOS tunnel diodes; direct recombination; emission spectra; indirect recombination; injected hot electron energetic relaxation; intraband optical transitions; luminescence spectra; oxide degradation testing; photon/phonon emission interplay; reabsorption; Artificial intelligence; Ash; Degradation; Electrodes; Electrons; Light emitting diodes; Luminescence; Phonons; Silicon; Tail;
fLanguage
English
Publisher
ieee
Conference_Titel
European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
Conference_Location
Estoril, Portugal
Print_ISBN
0-7803-7999-3
Type
conf
DOI
10.1109/ESSDERC.2003.1256934
Filename
1256934
Link To Document