• DocumentCode
    2443265
  • Title

    Overview of luminescence from MOS tunnel devices

  • Author

    Asli, N. ; Shulekin, A.F. ; Yoder, P.D. ; Vexler, M.I. ; Grekhov, I.V. ; Seegebrecht, P.

  • Author_Institution
    Technische Fakultat, Christian-Albrechts-Univ., Kiel, Germany
  • fYear
    2003
  • fDate
    16-18 Sept. 2003
  • Firstpage
    545
  • Lastpage
    548
  • Abstract
    The physical origin, observation conditions, simulation results and measured spectra of luminescence from MOS structures with a sub-3 nm oxide, are considered. The luminescence from such devices is related to the energetic relaxation of injected hot electrons and reflects the details of interplay between the photon and phonon emission. Measured spectra show the contribution from direct and indirect recombination and intraband optical transitions and are systematically changed by changing the operation conditions. Based on these spectra, it is possible to restore the net emission spectra by eliminating the reabsorption. Luminescence measurements on MOS tunnel structures are usable for oxide degradation tests if screening the recorded spectrum with the reference spectra.
  • Keywords
    MIS structures; electroluminescence; electron-hole recombination; hot carriers; phonons; tunnelling; 3 nm; MOS tunnel device luminescence; MOS tunnel diodes; direct recombination; emission spectra; indirect recombination; injected hot electron energetic relaxation; intraband optical transitions; luminescence spectra; oxide degradation testing; photon/phonon emission interplay; reabsorption; Artificial intelligence; Ash; Degradation; Electrodes; Electrons; Light emitting diodes; Luminescence; Phonons; Silicon; Tail;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
  • Conference_Location
    Estoril, Portugal
  • Print_ISBN
    0-7803-7999-3
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2003.1256934
  • Filename
    1256934