DocumentCode :
2445028
Title :
UV light sources with microwave excited molecular gas plasmas
Author :
Oh, Jun-Seok ; Pramanik, Bimal K. ; Kawamura, Kazumasa ; Hatta, Akimitsu
Author_Institution :
JST Innovation Satellite Koch, Kochi Univ. of Technol., Tosayamada
fYear :
2008
fDate :
15-19 June 2008
Firstpage :
1
Lastpage :
1
Abstract :
Molecular gas discharge plasma has long kept a higher potential to use as ultraviolet light source. The value of it should be rising to replace the common UV lightning using by toxic mercury. Our 3-years-work of this JST project has been founded as the following UV candidates, i.e., carbon monoxide (CO), nitrogen oxide (N2O2), water vapor (H2O), and its with rare gases. First, the CO has many of vacuum UV peaks from A1Pi to X1Sigma+ in wide range 150-210 nm. Among the peaks, we can choose and enhance few peaks. For example, a peak of 156 nm was enlarged twice as compare with maximum peak of pure CO at 173 nm. Second, the nitric oxide peaks (NO) have been optimized as through oxygen contents (10-20%). The many peaks are emitted from NO within a range of the germicidal effect (210-315 nm). Finally, the water vapor microwave discharge plasma has a peak at 310 nm from the OH radicals. It shows the most intense and concentrated UV emission at the saturated water vapor pressure at RT. We report the previous suggested gases but they are small parts of many of possible molecular gases as a UV light source.
Keywords :
carbon compounds; discharge lamps; discharges (electric); nitrogen compounds; plasma applications; plasma radiofrequency heating; ultraviolet sources; water; CO; H2O; JST project; N2O2; UV light sources; carbon monoxide; microwave excited molecular gas plasma; molecular gas discharge plasma; nitric oxide peaks; nitrogen oxide; rare gases; vacuum UV peaks; water vapor microwave discharge plasma; wavelength 150 nm to 315 nm; Fault location; Gases; Light sources; Microwave photonics; Microwave technology; Nitrogen; Plasma sources; Satellites; Technological innovation; Water resources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location :
Karlsruhe
ISSN :
0730-9244
Print_ISBN :
978-1-4244-1929-6
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2008.4591187
Filename :
4591187
Link To Document :
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