DocumentCode :
2445214
Title :
Pulsed low frequency plasma source
Author :
Teske, Christian ; Jacoby, J.
Author_Institution :
Johann Wolfgang Goethe Univ., Frankfurt
fYear :
2008
fDate :
15-19 June 2008
Firstpage :
1
Lastpage :
1
Abstract :
An inductively coupled pulsed plasma source with an operating frequency of 29 kHz is under investigation at the Institute for Applied Physics in Frankfurt. The experimental setup consists of a series resonance circuit with a load capacitance of 12 muF and a large diameter induction coil surrounding a spherical discharge vessel. During discharge generation pulse coil currents reached a maximum value of 10 kA with current rise times of 2 kA/mus while achieving an energy coupling efficiency of 80% between the driving circuit and the plasma. Pulse power peak values reached more than 1 MW. The current rise times required for plasma initiation were measured as a function of the applied gas pressure for Argon, Hydrogen, Helium and Nitrogen. A complete discharge sequence over a period of 120 mus was documented using a fast camera system. Moreover the spectroscopic diagnostic revealed a high fraction of ionized particles and an emission spectrum in the near UV domain. Electron densities reached peak values of 1021 m-3.
Keywords :
argon; discharges (electric); helium; hydrogen; nitrogen; plasma density; plasma diagnostics; plasma sources; Ar; Frankfurt; H; He; Institute for Applied Physics; N; applied gas pressure; capacitance 12 muF; current rise time; discharge sequence; frequency 29 kHz; inductively coupled pulsed plasma source; ionized particle fraction; large diameter induction coil; near UV emission spectrum; plasma electron density; plasma initiation; pulsed low frequency plasma source; series resonance circuit; spectroscopic diagnostics; spherical discharge vessel; Coils; Coupling circuits; Fault location; Frequency; Physics; Plasma measurements; Plasma sources; Pulse measurements; RLC circuits; Resonance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location :
Karlsruhe
ISSN :
0730-9244
Print_ISBN :
978-1-4244-1929-6
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2008.4591196
Filename :
4591196
Link To Document :
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