Title :
Reactive Ion Etching of Piezoelectric Films for Acoustic Wave Devices
Author :
Wang, J.S. ; Chen, Y.Y. ; Lakin, K.M.
Keywords :
Acoustic waves; Anisotropic magnetoresistance; Cathodes; Dry etching; Piezoelectric films; Plasma applications; Plasma devices; Plasma materials processing; Sputter etching; Zinc oxide;
Conference_Titel :
1982 Ultrasonics Symposium
Conference_Location :
San Diego, CA, USA
DOI :
10.1109/ULTSYM.1982.197843
