DocumentCode :
2450024
Title :
Annealing-related conductivity conversion in lightly Fe-doped n-type InP wafers
Author :
Fornari, R. ; Zappettini, A. ; Gombia, E. ; Mosca, R. ; Curti, M.
Author_Institution :
Istituto MASPEC, CNR, Parma, Italy
fYear :
1996
fDate :
29 Apr-3 May 1996
Firstpage :
9
Lastpage :
12
Abstract :
As-grown semiconducting InP wafers containing iron at a level between 5 and 8×1015 cm-3 were seen to convert to semi-insulating, with high resistivity and good mobility, after a thermal treatment at 900°C. This fact is interesting since it allows the preparation of semi-insulating InP with Fe content substantially lower than in standard LEC material. In this paper we report the annealing parameters and the results of an extensive electro-optical characterization of the treated samples. The experimental results suggest that the conductivity drop is mainly due to a considerable loss of shallow donors
Keywords :
III-V semiconductors; annealing; carrier mobility; electrical resistivity; indium compounds; iron; semiconductor doping; semiconductor materials; 900 C; InP:Fe; annealing-related conductivity conversion; good mobility; high resistivity; lightly Fe-doped n-type InP wafers; Annealing; Contamination; Crystals; Current measurement; Doping profiles; Indium phosphide; Iron; Semiconductivity; Substrates; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
Conference_Location :
Toulouse
Print_ISBN :
0-7803-3179-6
Type :
conf
DOI :
10.1109/SIM.1996.570865
Filename :
570865
Link To Document :
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