DocumentCode :
2450752
Title :
Efficient Monte Carlo device simulation with automatic error control
Author :
Bufler, F.M. ; Schenk, A. ; Fichtner, W.
Author_Institution :
Inst. fur Integrierte Syst., Eidgenossische Tech. Hochschule, Zurich, Switzerland
fYear :
2000
fDate :
2000
Firstpage :
27
Lastpage :
30
Abstract :
A single-particle approach to Monte Carlo device simulation is presented where the simulation is stopped when the error for the drain, substrate or gate current is below a predefined error bar. This is achieved by alternating an ensemble simulation in the contact elements, used for the injection of a carrier, with a single-particle simulation in the active device area, thus enabling stochastically independent current estimates. Together with efficient Monte Carlo techniques, leading to CPU times of typically one hour per bias point, this makes full-band Monte Carlo “affordable” for the simulation of submicron MOSFETs
Keywords :
MOSFET; Monte Carlo methods; electric current; error analysis; error correction; semiconductor device models; CPU times; MOSFETs; Monte Carlo device simulation; active device area; automatic error control; carrier injection; contact elements; drain current error; efficient Monte Carlo techniques; ensemble simulation; full-band Monte Carlo simulation; gate current error; predefined error bar; single-particle approach; single-particle simulation; stochastically independent current estimates; substrate current error; Automatic control; Boundary conditions; Computational modeling; Electrons; Error correction; Impurities; MOSFETs; Monte Carlo methods; Scattering; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on
Conference_Location :
Seattle, WA
Print_ISBN :
0-7803-6279-9
Type :
conf
DOI :
10.1109/SISPAD.2000.871198
Filename :
871198
Link To Document :
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