DocumentCode :
2450860
Title :
Direct solution of the Boltzmann transport equation in nanoscale Si devices
Author :
Banoo, Kausar ; Lundstrom, Mark ; Smith, R.
Author_Institution :
Sch. of Electr. Eng., Purdue Univ., West Lafayette, IN, USA
fYear :
2000
fDate :
2000
Firstpage :
50
Lastpage :
53
Abstract :
We report the first direct numerical solution to the Boltzmann transport equation (BTE) without making any approximations about the angular shape of the distribution function or the collision integral. The mathematical and numerical techniques used for solving this problem are discussed and shown to have the correct properties for semiconductor simulation. The applications of this method are general and are demonstrated here, for both one-dimensional (50 nm n+-p-n+) and two-dimensional (50 nm ultra-thin body dual-gate nMOSFET) devices
Keywords :
Boltzmann equation; MOSFET; bipolar transistors; elemental semiconductors; mathematical analysis; nanotechnology; numerical analysis; semiconductor device models; silicon; 1D n+-p-n+ devices; 2D ultra-thin body dual-gate nMOSFETs; 50 nm; Boltzmann transport equation; Si; collision integral; distribution function; mathematical techniques; nanoscale Si devices; numerical techniques; semiconductor simulation; Acceleration; Acoustic scattering; Boltzmann equation; Distribution functions; Integral equations; MOSFET circuits; Nanoscale devices; Optical scattering; Shape; Steady-state;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2000. SISPAD 2000. 2000 International Conference on
Conference_Location :
Seattle, WA
Print_ISBN :
0-7803-6279-9
Type :
conf
DOI :
10.1109/SISPAD.2000.871204
Filename :
871204
Link To Document :
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