DocumentCode :
2454138
Title :
Strain effects in GaN thin film growth
Author :
Kruger, Joachim ; Kisielowski, Christian ; Suski, Tadek ; Ruvimov, S. ; Liliental-Weber, Zuzanna ; Ager, J.W., III ; Rubin, Michael ; Weber, E.R.
Author_Institution :
Lawrence Berkeley Lab., CA, USA
fYear :
1996
fDate :
29 Apr-3 May 1996
Firstpage :
89
Lastpage :
92
Abstract :
Strain effects in GaN thin film crystals are analyzed by Photoluminescence (PL), X-ray and Raman scattering. All three methods can be consistently used to monitor strain that depends on the choice of substrate and other parameters. The high amount of stress incorporated in GaN hetero-expitaxial samples causes confusion as to assignment of the PL lines of donor bound excitons and donor-acceptor transitions. Homo-epitaxially grown GaN films provide a reference for unstrained films. The PL line positions of the donor acceptor pair transitions are found to exhibit a different stress coefficient than the excitonic line
Keywords :
III-V semiconductors; Raman spectra; X-ray diffraction; deformation; excitons; gallium compounds; impurity states; molecular beam epitaxial growth; photoluminescence; semiconductor epitaxial layers; semiconductor growth; semiconductor thin films; vapour phase epitaxial growth; GaN; GaN thin film; MBE; MOCVD; Raman scattering; X-ray scattering; donor bound excitons; donor-acceptor transitions; hetero-expitaxial samples; photoluminescence; strain effects; substrate; Capacitive sensors; Condition monitoring; Crystals; Excitons; Gallium nitride; Photoluminescence; Raman scattering; Stress; Substrates; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Semi-Insulating Materials Conference, 1996. IEEE
Conference_Location :
Toulouse
Print_ISBN :
0-7803-3179-6
Type :
conf
DOI :
10.1109/SIM.1996.570886
Filename :
570886
Link To Document :
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