DocumentCode
2455321
Title
Ultra low-loss high power AlGaN/GaN HFET switches
Author
Simin, Grigory ; Wang, J. ; Hu, X. ; Yang, J. ; Yang, Z. ; Gaska, R. ; Shur, M.
Author_Institution
Univ. of South Carolina, Columbia, SC
fYear
2008
fDate
15-19 June 2008
Firstpage
85
Lastpage
87
Abstract
Novel design concepts and cutting edge results are presented for high-power AlGaN/GaN Heterostructure Field-Effect Transistor switches for power converters, control and radio-frequency applications. For power switching, the HFET design has to be different from that of power amplifiers in order to minimize the contact resistance and avoid current crowding in the metal electrodes of large-periphery devices. Developed high-power III-Nitride HFET switches have the ON-resistance less than 1.25 Omega for a 3-mm wide multi-finger device, equivalent to less then 0.4 mOmegacm2 specific ON-resistance. New design and technology allows for low-loss power switching with above 1kV operating voltages, sub-nanosecond switching times, operating temperatures ranging from cryogenic up to 300degC and even higher.
Keywords
III-V semiconductors; aluminium compounds; field effect transistor switches; gallium compounds; power HEMT; power semiconductor switches; wide band gap semiconductors; AlGaN-GaN; contact resistance; heterostructure field-effect transistor; large-periphery device; metal electrode; power converter; radio-frequency applications; ultra low-loss high power HFET switch; Aluminum gallium nitride; Gallium nitride; HEMTs; MODFETs; Power amplifiers; Radio control; Radio frequency; Radiofrequency amplifiers; Switches; Switching converters;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics Specialists Conference, 2008. PESC 2008. IEEE
Conference_Location
Rhodes
ISSN
0275-9306
Print_ISBN
978-1-4244-1667-7
Electronic_ISBN
0275-9306
Type
conf
DOI
10.1109/PESC.2008.4591903
Filename
4591903
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