Title :
A volume diagnosis method for identifying systematic faults in lower-yield wafer occurring during mass production
Author :
Ishida, Tomoyuki ; Nitta, Isamu ; Banno, Koji ; Kanazawa, Yuji
Author_Institution :
Fujitsu Labs. Ltd., Kawasaki, Japan
Abstract :
This work focuses on volume diagnosis for identifying systematic faults in lower-yield wafers, whose yields are lower than baseline level due to systematic faults during mass production. We develop a model-based volume diagnosis method. To diagnose accurately using the fail data with one lower-yield wafer, we apply modeling techniques for handling pseudo-faults and random faults in the fail data. Experimental results show our method´s efficiency; we succeeded in identifying the failure layer for 20/22 data sets with actual lower-yield wafers.
Keywords :
fault diagnosis; mass production; semiconductor technology; handling pseudofaults; lower-yield wafer; mass production; model-based volume diagnosis method; modeling technique; random faults; systematic fault identification; Circuit faults; Fault diagnosis; Feature extraction; Integrated circuit modeling; Layout; Systematics;
Conference_Titel :
Design Automation Conference (ASP-DAC), 2014 19th Asia and South Pacific
Conference_Location :
Singapore
DOI :
10.1109/ASPDAC.2014.6742968