• DocumentCode
    2457251
  • Title

    Simulation of Atomic Force Microscopy (AFM) with applications to image analysis and control design

  • Author

    Belikov, Sergey

  • Author_Institution
    MikroMasch USA
  • fYear
    2009
  • fDate
    10-12 June 2009
  • Firstpage
    30
  • Lastpage
    30
  • Abstract
    Control of experiment is essential part of Atomic Force Microscopy (AFM). AFM is the technique in which is a minute probe is applied for high-resolution profiling of samples and studies of their mechanical and electric properties at the nanometer scale. The importance of this technique is increasing with miniaturization of functional industrial components and related need in comprehensive material characterization at small dimensions. In recent years control systems community expressed significant interest to AFM (several invited sessions at ACC 2008 and ACC 2009, publications in Control Systems Magazine). Further development of this method, which is related to transition to multi-frequency and broad band measurements and use increasing number of lock-in amplified, is inconceivable with proper advances in design and control of AFM instrumentation and applications. With increasing role of nanotechnology, AFM becomes an important tool in control education and research. However, few control experts have access to expensive AFM instrumentation. AFM Simulator allows control experts to demonstrate applicability of their theories and algorithms to AFM. This will increase the needed flow of ideas from control community to AFM instrument designers and practitioners. Simulator can be also introduced into control curriculums to expand them towards nanotechnology applications. All this shows the importance of this special session that will attract the control scientists and specialists to this valuable practical field.
  • Keywords
    Analytical models; Atomic force microscopy; Control design; Control systems; Force control; Image analysis; Instruments; Mechanical factors; Nanotechnology; Probes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    American Control Conference, 2009. ACC '09.
  • Conference_Location
    St. Louis, MO, USA
  • ISSN
    0743-1619
  • Print_ISBN
    978-1-4244-4523-3
  • Electronic_ISBN
    0743-1619
  • Type

    conf

  • DOI
    10.1109/ACC.2009.5159788
  • Filename
    5159788