• DocumentCode
    2462676
  • Title

    Charge composition and ion energy in the plasma of a magnetically focused vacuum-arc source

  • Author

    Aksenov, I.I. ; Khoroshikh, V.M.

  • Author_Institution
    Nat. Sci. Center, Kharkov Inst. of Phys. & Technol., Ukraine
  • Volume
    2
  • fYear
    1998
  • fDate
    17-21 Aug 1998
  • Firstpage
    570
  • Abstract
    The effect of magnetic fields on the plasma ion component in a vacuum arc source devised for coating deposition has been investigated. Mass spectrometry measurements were made to study the charge composition of a Ti-plasma ion flow versus the focusing magnetic field; the ion energy and the electron temperature were measured by probe methods. Interpretation of the relationships obtained is offered in terms of angular distributions of ion flows with different charge multiplicities, the ion energy as a function of the direction of ion motion and the magnetic field topography in the flow focusing region
  • Keywords
    magnetic fields; mass spectroscopy; plasma deposited coatings; plasma deposition; plasma flow; vacuum arcs; Ti; charge composition; charge multiplicities; coating deposition; electron temperature; flow focusing region; ion energy; ion motion; magnetic field topography; magnetic fields; mass spectrometry measurements; plasma ion component; probe methods; vacuum arc source; Charge measurement; Current measurement; Energy measurement; Fluid flow measurement; Magnetic field measurement; Plasma measurements; Plasma sources; Plasma temperature; Temperature measurement; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
  • Conference_Location
    Eindhoven
  • ISSN
    1093-2941
  • Print_ISBN
    0-7803-3953-3
  • Type

    conf

  • DOI
    10.1109/DEIV.1998.738723
  • Filename
    738723