DocumentCode
2462676
Title
Charge composition and ion energy in the plasma of a magnetically focused vacuum-arc source
Author
Aksenov, I.I. ; Khoroshikh, V.M.
Author_Institution
Nat. Sci. Center, Kharkov Inst. of Phys. & Technol., Ukraine
Volume
2
fYear
1998
fDate
17-21 Aug 1998
Firstpage
570
Abstract
The effect of magnetic fields on the plasma ion component in a vacuum arc source devised for coating deposition has been investigated. Mass spectrometry measurements were made to study the charge composition of a Ti-plasma ion flow versus the focusing magnetic field; the ion energy and the electron temperature were measured by probe methods. Interpretation of the relationships obtained is offered in terms of angular distributions of ion flows with different charge multiplicities, the ion energy as a function of the direction of ion motion and the magnetic field topography in the flow focusing region
Keywords
magnetic fields; mass spectroscopy; plasma deposited coatings; plasma deposition; plasma flow; vacuum arcs; Ti; charge composition; charge multiplicities; coating deposition; electron temperature; flow focusing region; ion energy; ion motion; magnetic field topography; magnetic fields; mass spectrometry measurements; plasma ion component; probe methods; vacuum arc source; Charge measurement; Current measurement; Energy measurement; Fluid flow measurement; Magnetic field measurement; Plasma measurements; Plasma sources; Plasma temperature; Temperature measurement; Vacuum arcs;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location
Eindhoven
ISSN
1093-2941
Print_ISBN
0-7803-3953-3
Type
conf
DOI
10.1109/DEIV.1998.738723
Filename
738723
Link To Document