Title :
Vacuum-arc-generated macro particles in the nanometer range
Author :
Monteiro, Othon R. ; Anders, André
Author_Institution :
Lawrence Berkeley Nat. Lab., California Univ., Berkeley, CA, USA
Abstract :
Micron and sub-micron “macroparticles” are produced along with the plasma at vacuum arc cathode spots. Published data refer to the size range 0.2-100 μm. The lower limit is determined by the resolution of the equipment used (usually scanning electron microscopes). In the present study, the authors focus on the detection and characterization of nanosize macroparticles (“nanoparticles”) using atomic force microscopy and field-emission scanning electron microscopy. New information is gathered on material-dependent size distribution functions as well as on the effectiveness of magnetic filtering for nanoparticles
Keywords :
atomic force microscopy; field emission electron microscopy; plasma deposited coatings; plasma deposition; scanning electron microscopy; vacuum arcs; 0.2 to 100 mum; atomic force microscopy; characterization; detection; field-emission scanning electron microscopy; magnetic filtering; material-dependent size distribution functions; nanosize macroparticles generation; scanning electron microscopes; vacuum arc cathode spots; vacuum arc plasma deposition; Atomic force microscopy; Cathodes; Distribution functions; Information filtering; Information filters; Magnetic separation; Nanoparticles; Plasmas; Scanning electron microscopy; Vacuum arcs;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location :
Eindhoven
Print_ISBN :
0-7803-3953-3
DOI :
10.1109/DEIV.1998.738739
