DocumentCode :
2463619
Title :
Evaluation of the in-situ UV oxidation technioue for tunnel-junction preparation
Author :
Girgis, E. ; Boeve, H. ; De Boeck, J. ; Schelten, J. ; Borghs, G.
Author_Institution :
IMEC
fYear :
2000
fDate :
9-13 April 2000
Firstpage :
364
Lastpage :
364
Keywords :
Breakdown voltage; Electric breakdown; Electrical resistance measurement; Electrodes; Insulation; Optical films; Oxidation; Temperature; Transistors; Tunneling magnetoresistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Magnetics Conference, 2000. INTERMAG 2000 Digest of Technical Papers. 2000 IEEE International
Conference_Location :
Toronto, ON, Canada
Print_ISBN :
0-7803-5943-7
Type :
conf
DOI :
10.1109/INTMAG.2000.872139
Filename :
872139
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2463619
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