Title :
N2 gas absorption in cathodic arc apparatus with Al cathode under medium vacuum
Author :
Takikawa, Hirofumi ; Kawakami, Noriko ; Sakakibara, Tateki
Author_Institution :
Toyohashi Univ. of Technol., Aichi, Japan
Abstract :
Al evaporation and N2 absorption rates during a cathodic arc evaporation process with an Al cathode and N2 gas flow are measured as a function of process pressure. These rates decrease as the pressure increases. The ratio of Al evaporation rate to N2 absorption rate is about 2:1. The film deposited on the anode chamber is analyzed by XRD and found to be AlN. The result indicates that N2 gas is mostly absorbed and fixed in the film as a form of AlN by the getter action of the Al ion
Keywords :
X-ray diffraction; absorption; aluminium compounds; cathodes; evaporation; plasma deposited coatings; plasma deposition; pressure; vacuum arcs; Al; AlN; AlN thin films; N2; N2 gas absorption; XRD; absorption rates; cathode; cathodic arc apparatus; cathodic arc evaporation process; evaporation rate; getter action; process pressure; vacuum arc depostion method; Absorption; Artificial intelligence; Atomic measurements; Cathodes; Dielectrics and electrical insulation; Ignition; Power supplies; Surface resistance; Vacuum arcs; Voltage;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location :
Eindhoven
Print_ISBN :
0-7803-3953-3
DOI :
10.1109/DEIV.1998.738771
