• DocumentCode
    2463635
  • Title

    N2 gas absorption in cathodic arc apparatus with Al cathode under medium vacuum

  • Author

    Takikawa, Hirofumi ; Kawakami, Noriko ; Sakakibara, Tateki

  • Author_Institution
    Toyohashi Univ. of Technol., Aichi, Japan
  • Volume
    2
  • fYear
    1998
  • fDate
    17-21 Aug 1998
  • Firstpage
    597
  • Abstract
    Al evaporation and N2 absorption rates during a cathodic arc evaporation process with an Al cathode and N2 gas flow are measured as a function of process pressure. These rates decrease as the pressure increases. The ratio of Al evaporation rate to N2 absorption rate is about 2:1. The film deposited on the anode chamber is analyzed by XRD and found to be AlN. The result indicates that N2 gas is mostly absorbed and fixed in the film as a form of AlN by the getter action of the Al ion
  • Keywords
    X-ray diffraction; absorption; aluminium compounds; cathodes; evaporation; plasma deposited coatings; plasma deposition; pressure; vacuum arcs; Al; AlN; AlN thin films; N2; N2 gas absorption; XRD; absorption rates; cathode; cathodic arc apparatus; cathodic arc evaporation process; evaporation rate; getter action; process pressure; vacuum arc depostion method; Absorption; Artificial intelligence; Atomic measurements; Cathodes; Dielectrics and electrical insulation; Ignition; Power supplies; Surface resistance; Vacuum arcs; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
  • Conference_Location
    Eindhoven
  • ISSN
    1093-2941
  • Print_ISBN
    0-7803-3953-3
  • Type

    conf

  • DOI
    10.1109/DEIV.1998.738771
  • Filename
    738771
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2463635