DocumentCode :
2463861
Title :
Superposition of two plasma beams produced in a vacuum arc deposition apparatus
Author :
Zhitomirsky, V.N. ; Boxman, R.L. ; Goldsmith, S. ; Grimberg, I. ; Weiss, B.Z.
Author_Institution :
Dept. of Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel
Volume :
2
fYear :
1998
fDate :
17-21 Aug 1998
Firstpage :
609
Abstract :
Two plasma beams of different materials were produced from Ti, Zr or Nb cathodes in a triple-cathode vacuum arc deposition apparatus. The cathodes were arranged in a circle centered on the system axis. The plasma produced was transported through a straight plasma duct with an axial magnetic field, into a deposition chamber, in which a single Langmuir probe, an array of probes, or a substrate could be mounted 560 mm from the cathode plane. The saturation ion current produced by one cathode, or by the simultaneous operation of two different cathodes, was measured in vacuum and in a 0.13-2.7 Pa nitrogen background. The spatial distribution of the composition of coatings deposited during simultaneous operation of different cathodes in nitrogen was also studied. It was shown that the ion current produced by each single cathode, and by the simultaneous operation of two cathodes, decreased by a factor of 20-100 when the nitrogen pressure was increased from vacuum to P=2.7 Pa. During simultaneous operation of two cathodes, the ion saturation current was less than the sum of the ion currents produced by each cathode individually when P<0.4 Pa, while the simultaneous ion current was less than the sum of the individual ion currents when P⩾20.4 Pa
Keywords :
cathodes; plasma deposited coatings; plasma deposition; plasma probes; plasma production; pressure; vacuum arcs; 0.13 to 2.7 Pa; 2.7 Pa; 560 mm; Langmuir probe; Nb; Ti; Zr; axial magnetic field; coatings composition; deposition chamber; plasma beams superposition; plasma production; saturation ion current; spatial distribution; straight plasma duct; triple-cathode vacuum arc deposition apparatus; Cathodes; Magnetic field measurement; Magnetic materials; Nitrogen; Particle beams; Plasma materials processing; Plasma transport processes; Probes; Vacuum arcs; Zirconium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location :
Eindhoven
ISSN :
1093-2941
Print_ISBN :
0-7803-3953-3
Type :
conf
DOI :
10.1109/DEIV.1998.738785
Filename :
738785
Link To Document :
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