DocumentCode
2464200
Title
Spin valve device with sub-half micron core width fabricated by reactive etching
Author
Iijima, M. ; Kishi, H. ; Tanaka, A. ; Kamata, C. ; Eguchi, S.
Author_Institution
Fujitsu Ltd.
fYear
2000
fDate
9-13 April 2000
Firstpage
394
Lastpage
394
Keywords
Electromagnetic devices; Fabrication; Laboratories; Magnetic cores; Magnetic semiconductors; Plasma applications; Plasma devices; Spin valves; Sputter etching; Sulfur hexafluoride;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2000. INTERMAG 2000 Digest of Technical Papers. 2000 IEEE International
Conference_Location
Toronto, ON, Canada
Print_ISBN
0-7803-5943-7
Type
conf
DOI
10.1109/INTMAG.2000.872169
Filename
872169
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