DocumentCode :
2464742
Title :
Nanosecond high current and high repetition rate electron source
Author :
Gushenets, V.I. ; Koval, N.N. ; Schanin, P.M. ; Tolkachev, V.S.
Author_Institution :
High Current Electron. Inst., Tomsk, Russia
Volume :
2
fYear :
1998
fDate :
17-21 Aug 1998
Firstpage :
649
Abstract :
A broad electron beam source with a plasma hollow cathode has been developed which is intended for the production of nanosecond electron beams with a high repetition rate. The source lifetime is over 109 shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 keV, a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced
Keywords :
cathodes; electron beams; glow discharges; plasma devices; power supplies to apparatus; pulse generators; pulsed power technology; 100 ns; 200 A; 25 ns; 40 keV; 50 to 1000 Hz; accelerating voltage; auxiliary triggering glow discharge; broad electron beam source; cathode cavity; nanosecond electron beam production; operating pressure; plasma formation time; plasma hollow cathode; pulse duration; pulse repetition rate; pulsed power; source lifetime; Acceleration; Cathodes; Electrodes; Electron beams; Electron sources; Fault location; Glow discharges; Plasma accelerators; Plasma sources; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location :
Eindhoven
ISSN :
1093-2941
Print_ISBN :
0-7803-3953-3
Type :
conf
DOI :
10.1109/DEIV.1998.738831
Filename :
738831
Link To Document :
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