Title :
Nonmonotonic potential distribution and current quenching mechanism in plasma-filled diode
Author :
Kondrat´eva, N.P. ; Korolev, Yu.D. ; Koval, N.N. ; Rabotkin, V.G. ; Schanin, P.M. ; Shemyakin, I.A.
Author_Institution :
Inst. of High-Current Electron., Acad. of Sci., Tomsk, Russia
Abstract :
The phenomenon of current quenching in a plasma filled diode forms the basis for operation of the so called plasma erosion opening switch. In typical operation conditions of the switch, a vacuum gap is preliminarily filled with a plasma from an external source after which a voltage is applied to the gap and an external electric circuit provides for a current rise with a characteristic time of the order of 1 μs. When the current reaches some critical value the resistance of the gap sharply increases so that the current quenching and the corresponding voltage kick occurs, i.e. the gap opens for a short time. A widely used approach for interpretation of the current quenching mechanism is based on the supposition that the gap conductivity is totally determined by the plasma generated by external source. In our opinion, this viewpoint is not exactly correct, especially for the microsecond time scale, and the current passage mechanism is mainly determined by the cathode spot plasma. A foundation of this approach is presented in this paper
Keywords :
cathodes; electric resistance; electrical conductivity; plasma diodes; plasma switches; cathode spot plasma; current passage mechanism; current quenching mechanism; current rise; external electric circuit; external source plasma; gap conductivity; gap resistance; microsecond time scale; nonmonotonic potential distribution; plasma erosion opening switch; plasma-filled diode; vacuum gap; Anodes; Cathodes; Circuits; Diodes; Electrodes; Plasma properties; Plasma sources; Surface discharges; Switches; Voltage;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location :
Eindhoven
Print_ISBN :
0-7803-3953-3
DOI :
10.1109/DEIV.1998.738842