DocumentCode :
2464976
Title :
Toroidal microcavity lasers based on Er-doped silica-alumina glasses
Author :
Ha, Chu Thi Thu ; Bui Van Thien ; Vinh, Ha Xuan ; Hieu, Le Minh ; Cham, Tran Thi ; Pham Van Hoi
Author_Institution :
Nat. Key Lab. for Electron. Mater. & Device, Vietnamese Acad. of Sci. & Technol., Hanoi
fYear :
2008
fDate :
6-9 Oct. 2008
Firstpage :
380
Lastpage :
383
Abstract :
The toroidal microcavity laser based on high-concentration erbium-doped silica-alumina glasses, which was developed by molten method using CO2-laser beam, is presented in detail. Average erbium ion concentrations were in the range from 2500 to 3000 ppm and an output lasing power as high as -5.0 dBm is obtained from toroidal microcavities with equatorial diameters in the range 90-140 mum. The advantages of toroidal cavity are followings: Q-factor of the cavity is increasing in comparison with spherical cavity and number of whispering-gallery modes (WGM) is decreased. Controlling lasing wavelength and number of lasing mode was possible by changing the distance between the tapered optical fiber and the toroidal cavity. The very narrow line-width of laser spectra may be useful for photonic sensor.
Keywords :
Q-factor; alumina; erbium; laser modes; microcavity lasers; optical glass; silicon compounds; whispering gallery modes; Q-factor; SiO2-Al2O3:Er; WGM; erbium ion concentrations; high-concentration erbium-doped silica-alumina glasses; laser spectra; lasing mode; lasing wavelength; molten method; output lasing power; photonic sensor; tapered optical fiber; toroidal microcavity laser; whispering-gallery modes; Erbium; Erbium-doped fiber lasers; Glass; Laser beams; Microcavities; Optical control; Optical fibers; Optoelectronic and photonic sensors; Q factor; Whispering gallery modes; Quantum-electrodynamics cavity; high-concentration erbium-doped silica-alumina glass; toroidal microcavity laser;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Technologies for Communications, 2008. ATC 2008. International Conference on
Conference_Location :
Hanoi
Print_ISBN :
978-1-4244-2680-5
Electronic_ISBN :
978-1-4244-2681-2
Type :
conf
DOI :
10.1109/ATC.2008.4760602
Filename :
4760602
Link To Document :
بازگشت