DocumentCode :
2467329
Title :
A differential difference amplifier for neural recording system with tunable low-frequency cutoff
Author :
Yao, Kai-Wen ; Lin, Wei-Chih ; Gong, Cihun-Siyong Alex ; Lin, Yu-Ying ; Shiue, Muh-Tian
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Jhongli
fYear :
2008
fDate :
8-10 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
This paper describes a low-noise and low-power architecture of the differential difference amplifier (DDA) for neural recording system. The proposed neural amplifier combines DC offset rejection and low-frequency cutoff tuning without off-chip components. DC offset rejection is carried out by ac coupling which is realized by series connection of a capacitor and a MOS-bipolar pseudoresistor. Low-frequency cutoff tuning permits recording local field potential or neural action potential. Frequency tuning mechanism depends on the feedback capacitor and floating tunable resistor which constructs a low frequency pole nearby 100 Hz. The proposed design is in TSMC 0.18 mum 1P6M CMOS process, which achieves gain of 40.8 dB, passband from 107 Hz to 10.3 kHz, input-referred noise of 4.83 muVrms, power consumption of 25.9 muW, and 0.084 mm2 of chip area.
Keywords :
differential amplifiers; low noise amplifiers; low-power electronics; neural chips; DC offset rejection; MOS-bipolar pseudoresistor; ac coupling; capacitor series connection; differential difference amplifier; feedback capacitor; floating tunable resistor; frequency 107 Hz to 10.3 kHz; gain 40.8 dB; low frequency pole; low-frequency cutoff tuning; low-noise architecture; low-power architecture; neural action potential; neural amplifier; neural recording system; power 25.9 muW; size 0.18 mum; tunable low-frequency cutoff; CMOS process; Capacitors; Differential amplifiers; Frequency; Gain; Low-noise amplifiers; Neurofeedback; Passband; Resistors; Tuning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2008. EDSSC 2008. IEEE International Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-2539-6
Electronic_ISBN :
978-1-4244-2540-2
Type :
conf
DOI :
10.1109/EDSSC.2008.4760720
Filename :
4760720
Link To Document :
بازگشت