• DocumentCode
    2467573
  • Title

    Fabrication HfOx nanopatterns by atomic force microscopy lithography

  • Author

    An, J. ; Xue, K. ; Xu, J.B.

  • Author_Institution
    Dept. of Electron., Chinese Univ. of Hong Kong, Shatin
  • fYear
    2008
  • fDate
    8-10 Dec. 2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The HfOx nanopatterns are fabricated with the aid of atomic force microscopy (AFM), which shows the great capacity of the local anodic oxidation (LAO) on the potential field of nano-scale device fabrications. Moreover, the kinetic mechanisms of the anodic HfOx growth are discussed in detail.
  • Keywords
    atomic force microscopy; hafnium compounds; nanofabrication; nanolithography; nanopatterning; HfOx; atomic force microscopy lithography; kinetic mechanisms; local anodic oxidation; nanopatterns; nanoscale device fabrications; Atomic force microscopy; Fabrication; Hafnium oxide; Kinetic theory; Nanopatterning; Nanoscale devices; Oxidation; Silicon; Space vector pulse width modulation; Surface topography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices and Solid-State Circuits, 2008. EDSSC 2008. IEEE International Conference on
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-2539-6
  • Electronic_ISBN
    978-1-4244-2540-2
  • Type

    conf

  • DOI
    10.1109/EDSSC.2008.4760734
  • Filename
    4760734
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2467573