Title :
Fabrication HfOx nanopatterns by atomic force microscopy lithography
Author :
An, J. ; Xue, K. ; Xu, J.B.
Author_Institution :
Dept. of Electron., Chinese Univ. of Hong Kong, Shatin
Abstract :
The HfOx nanopatterns are fabricated with the aid of atomic force microscopy (AFM), which shows the great capacity of the local anodic oxidation (LAO) on the potential field of nano-scale device fabrications. Moreover, the kinetic mechanisms of the anodic HfOx growth are discussed in detail.
Keywords :
atomic force microscopy; hafnium compounds; nanofabrication; nanolithography; nanopatterning; HfOx; atomic force microscopy lithography; kinetic mechanisms; local anodic oxidation; nanopatterns; nanoscale device fabrications; Atomic force microscopy; Fabrication; Hafnium oxide; Kinetic theory; Nanopatterning; Nanoscale devices; Oxidation; Silicon; Space vector pulse width modulation; Surface topography;
Conference_Titel :
Electron Devices and Solid-State Circuits, 2008. EDSSC 2008. IEEE International Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-2539-6
Electronic_ISBN :
978-1-4244-2540-2
DOI :
10.1109/EDSSC.2008.4760734
