DocumentCode :
2467789
Title :
III-nitride heterojunction FETs : Future perspectives
Author :
Kuzuhara, Masaaki
Author_Institution :
Grad. Sch. of Eng., Univ. of Fukui, Fukui
fYear :
2008
fDate :
8-10 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
III-nitride electron devices are attracting considerable attention for future wireless communication equipments and power electronics systems. This paper gives an overview on the state-of-the-art performance of AlGaN/GaN heterojunction FETs and describes some key issues concerning further improvements in the device performance. Focus is also on the future perspectives of III-nitride-based transistor applications.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device breakdown; AlGaN-GaN; electron devices; heterojunction FET; Aluminum gallium nitride; FETs; Gallium arsenide; Gallium nitride; HEMTs; Heterojunctions; Power engineering and energy; Power generation; Semiconductor device breakdown; Semiconductor devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices and Solid-State Circuits, 2008. EDSSC 2008. IEEE International Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-2539-6
Electronic_ISBN :
978-1-4244-2540-2
Type :
conf
DOI :
10.1109/EDSSC.2008.4760744
Filename :
4760744
Link To Document :
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