• DocumentCode
    2468267
  • Title

    Reliability research on power MOSFET using coupled electrical-thermal-mechanical analysis

  • Author

    Li, Qiuyang ; Zhai, Guofu ; Wang, Shujuan

  • Author_Institution
    Sch. of Electr. Eng. & Autom., Harbin Inst. of Tech., Harbin, China
  • fYear
    2012
  • fDate
    23-25 May 2012
  • Firstpage
    1
  • Lastpage
    5
  • Abstract
    As an integral component of electronic equipments, power MOSFET with its degenerate performance affects the reliability of the whole system. The modeling of power device based on structural geometry, material properties, and boundary conditions can reduce the repetition test and shorten the failure analysis cycle. In this paper, coupled electrical-thermal-mechanical analysis based on finite element model of TO-247 package power MOSFET was performed. First, electrical-thermal simulation was accomplished to obtain the distribution of temperature under power cycling. Then, thermal-mechanical analysis was carried out to calculate the inelastic strain range generated by the thermal stress. Finally, on the basis of simulations above, the fatigue path can be achieved to predict the thermal fatigue life of MOSFET by Coffin-Manson´s law.
  • Keywords
    finite element analysis; power MOSFET; semiconductor device models; semiconductor device reliability; Coffin-Manson´s law; TO-247 package power MOSFET; boundary conditions; electrical-thermal simulation; electrical-thermal-mechanical analysis; electronic equipments; failure analysis cycle; finite element model; material properties; power device modeling; reliability research; structural geometry; thermal stress; Analytical models; Electromagnetic compatibility; Gold; MOSFET circuits; Reliability; Solid modeling; Thermal analysis; ANSYS; Power MOSFET; coupled electric-thermal-mechanical analysis; finite element model;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Prognostics and System Health Management (PHM), 2012 IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    2166-563X
  • Print_ISBN
    978-1-4577-1909-7
  • Electronic_ISBN
    2166-563X
  • Type

    conf

  • DOI
    10.1109/PHM.2012.6228795
  • Filename
    6228795