High-gain integrated tapered dielectric antenna for millimeter-wave applications

This paper presents a high-efficiency tapered dielectric antenna made of high-resistivity Silicon (Si). The antenna is designed based on a compromise between the high-gain and short length. The fabrication process is based on photolithography and dry etching which are well-known techniques in the Si-based fabrication technology. The proposed antenna is compatible with the millimeter-wave integrated circuit based on the Si image-guide.