DocumentCode :
2470500
Title :
Interdiffusion in GaAs-AlGaAs quantum wells using anodic and thermal oxides of GaAs
Author :
Yuan, S. ; Li, G. ; Cohen, R.M. ; Fu, L. ; Tan, H.H. ; Johnston, M.B. ; Dao, L.V. ; Gal, M. ; Jagadish, C.
Author_Institution :
Res. Sch. of Phys. Sci., Australian Nat. Univ., Canberra, ACT, Australia
Volume :
2
fYear :
1998
fDate :
3-4 Dec 1998
Firstpage :
36
Abstract :
Interdiffusion in quantum wells (QW) is of current interest for optoelectronic device applications. Interdiffusion between quantum well and barriers allow the modification of quantum well shapes which in turn leads to changes in subband energies in the conduction and valence bands. This allows to modify band gap energy, absorption coefficient and refractive index. Monolithic integration of various optoelectronic devices such as lasers, modulators, detectors and waveguides can be achieved by selective area quantum well intermixing/interdiffusion
Keywords :
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; integrated optoelectronics; optoelectronic devices; semiconductor quantum wells; GaAs-AlGaAs; GaAs-AlGaAs quantum wells; absorption coefficient; anodic oxides; band gap energy; conduction bands; interdiffusion; optoelectronic device applications; optoelectronic devices; quantum well intermixing; quantum well shapes; refractive index; subband energies; thermal oxides; valence bands; Cities and towns; Gallium arsenide; Impurities; Materials science and technology; Optoelectronic devices; Oxidation; Photonic band gap; Rapid thermal annealing; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-4947-4
Type :
conf
DOI :
10.1109/LEOS.1998.739448
Filename :
739448
Link To Document :
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