Title :
The effect of W, Si on antioxidation of TiAl based alloy
Author :
Ye, Xicong ; Liu, Wenjun ; Zhang, Lihong
Author_Institution :
Coll. of Mech. & Mater., China Three Gorges Univ., Yichang, China
Abstract :
The TiAl based alloy have fine lamina structures after solution treatment (1370 °C, 120min, 50 °C water quench). With the addition of W element, the O content is increased form base inside to outside, and the oxidation layer is upward 6um The oxidation layer is reduced from 6um to 3um after Si element addition (0.5%at). The oxidation layers are alternated between TiO2 and Al2O3, and the outmost layer is TiO2. With the addition of Si element, the oxidation resistance is improved.
Keywords :
alloying additions; oxidation; quenching (thermal); silicon alloys; titanium alloys; tungsten alloys; TiAlSi; TiAlW; antioxidation; fine lamina structures; oxidation resistance; solution treatment; temperature 1370 degC; temperature 50 degC; time 120 min; water quench; Aluminum oxide; Heat treatment; Oxidation; Resistance; Silicon; TiAl based alloy; heat treatment; oxidation; solution hardening; structure;
Conference_Titel :
Remote Sensing, Environment and Transportation Engineering (RSETE), 2011 International Conference on
Conference_Location :
Nanjing
Print_ISBN :
978-1-4244-9172-8
DOI :
10.1109/RSETE.2011.5965839
