DocumentCode :
2471399
Title :
Processing and properties of ytterbium-erbium silicate thin film gain media
Author :
Vanhoutte, Michiel ; Wang, Bing ; Michel, Jürgen ; Kimerling, Lionel C.
Author_Institution :
Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
63
Lastpage :
65
Abstract :
The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er2O3, Yb2O3 and SiO2 on c-Si and subsequent annealing in N2 or O2 atmosphere.
Keywords :
annealing; erbium compounds; photoluminescence; sputter deposition; thin films; ytterbium compounds; N2 atmosphere; O2 atmosphere; RF-magnetron cosputtering; Si; Yb1.8Er0.2SiO5; annealing; gain media; photoluminescence; structural properties; ytterbium-erbium silicate thin films; Annealing; Atmosphere; Erbium; Optical fibers; Optical materials; Photoluminescence; Sputtering; Temperature; Transistors; X-ray scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
1949-2081
Print_ISBN :
978-1-4244-4402-1
Electronic_ISBN :
1949-2081
Type :
conf
DOI :
10.1109/GROUP4.2009.5338289
Filename :
5338289
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2471399
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