• DocumentCode
    2471399
  • Title

    Processing and properties of ytterbium-erbium silicate thin film gain media

  • Author

    Vanhoutte, Michiel ; Wang, Bing ; Michel, Jürgen ; Kimerling, Lionel C.

  • Author_Institution
    Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
  • fYear
    2009
  • fDate
    9-11 Sept. 2009
  • Firstpage
    63
  • Lastpage
    65
  • Abstract
    The structural and photoluminescence properties of ytterbium-erbium silicate thin films have been investigated. The films were fabricated by RF-magnetron co-sputtering of Er2O3, Yb2O3 and SiO2 on c-Si and subsequent annealing in N2 or O2 atmosphere.
  • Keywords
    annealing; erbium compounds; photoluminescence; sputter deposition; thin films; ytterbium compounds; N2 atmosphere; O2 atmosphere; RF-magnetron cosputtering; Si; Yb1.8Er0.2SiO5; annealing; gain media; photoluminescence; structural properties; ytterbium-erbium silicate thin films; Annealing; Atmosphere; Erbium; Optical fibers; Optical materials; Photoluminescence; Sputtering; Temperature; Transistors; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4244-4402-1
  • Electronic_ISBN
    1949-2081
  • Type

    conf

  • DOI
    10.1109/GROUP4.2009.5338289
  • Filename
    5338289