Q-factor tuning in all-active whispering-gallery mode resonators with Si-nc

Author

Pitanti, A. ; Ghulinyan, M. ; Xie, M. ; Pucker, G. ; Pavesi, L.

Author_Institution

Dipt. di Fis., Univ. degli studi di Trento, Povo, Italy

fYear

2009

fDate

9-11 Sept. 2009

Firstpage

31

Lastpage

33

Abstract

Q-factor tuning in stress-engineered microresonators is presented. Bent-edge microdisks (mu-kylix), where highest Q´s are 60 nm blue-shifted with respect to flat disks, are used to probe Purcell enhancement of Si-nc emission rate in a wide spectral range.

Keywords

Q-factor; elemental semiconductors; integrated optics; micro-optics; microcavities; micromechanical resonators; nanostructured materials; optical resonators; optical tuning; photoluminescence; silicon; spectral line shift; spontaneous emission; whispering gallery modes; Purcell enhancement; Q-factor tuning; Si; all-active whispering-gallery mode resonators; bent-edge microdisks; blue-shift; flat disks; microphotoluminescence; silicon nanocrystal; spontaneous emission rate; stress-engineered microresonators; Dielectric materials; III-V semiconductor materials; Laser tuning; Microcavities; Optical losses; Optical materials; Optical resonators; Optical scattering; Q factor; Whispering gallery modes;

fLanguage

English

Publisher

ieee

Conference_Titel

Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on

Conference_Location

San Francisco, CA

ISSN

1949-2081

Print_ISBN

978-1-4244-4402-1

Electronic_ISBN

1949-2081

Type

conf

DOI

10.1109/GROUP4.2009.5338298

Filename

5338298