Title :
Ion Implantation Characterisation: A Comparison of Photothermal Radiometric and Photodisplacement Thermal Wave Techniques
Author :
Crean, G.M. ; Sheard, S.J. ; See, C.W. ; Somekh, M.G.
Keywords :
Boron; Fabrication; Implants; Ion implantation; Microscopy; Monitoring; Process control; Radiometry; Silicon; Very large scale integration;
Conference_Titel :
IEEE 1987 Ultrasonics Symposium
Conference_Location :
Denver, Colorado, USA
DOI :
10.1109/ULTSYM.1987.199027
