• DocumentCode
    2472113
  • Title

    Approach to modify crystalline structures of Er2SiO5 by pulsed laser deposition

  • Author

    Tanaka, Y. ; Kimura, T. ; Isshiki, H.

  • Author_Institution
    Dept. of Electron. Eng., Univ. of Electro-Commun., Chofu, Japan
  • fYear
    2009
  • fDate
    9-11 Sept. 2009
  • Firstpage
    184
  • Lastpage
    186
  • Abstract
    Er2SiO5 crystal shows strong and sharp Er-related PL emissions at room temperature. It is expected as a basic material of waveguide amplifiers in silicon photonics. Recently we have proposed Er2SiO5 crystal preparation by Pulsed Laser Deposition (PLD) method for device applications. In this paper we introduce PLD approach to modify crystalline structures of Er2SiO5 crystal and the related materials. Here we focus on formation of Er2SiO5/Si stacked structure toward light emitting devices (LEDs) and formation of ErxY2-xSiO5 systems to reduce upconversion effectively.
  • Keywords
    crystals; erbium compounds; laser materials processing; light emitting devices; pulsed laser deposition; silicon compounds; Er2SiO5; LED; light emitting devices; modify crystalline structures; pulsed laser deposition; waveguide amplifiers; Crystalline materials; Crystallization; Erbium; Optical materials; Optical pulses; Photonic crystals; Pulse amplifiers; Pulsed laser deposition; Silicon; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    1949-2081
  • Print_ISBN
    978-1-4244-4402-1
  • Electronic_ISBN
    1949-2081
  • Type

    conf

  • DOI
    10.1109/GROUP4.2009.5338323
  • Filename
    5338323