DocumentCode :
2472113
Title :
Approach to modify crystalline structures of Er2SiO5 by pulsed laser deposition
Author :
Tanaka, Y. ; Kimura, T. ; Isshiki, H.
Author_Institution :
Dept. of Electron. Eng., Univ. of Electro-Commun., Chofu, Japan
fYear :
2009
fDate :
9-11 Sept. 2009
Firstpage :
184
Lastpage :
186
Abstract :
Er2SiO5 crystal shows strong and sharp Er-related PL emissions at room temperature. It is expected as a basic material of waveguide amplifiers in silicon photonics. Recently we have proposed Er2SiO5 crystal preparation by Pulsed Laser Deposition (PLD) method for device applications. In this paper we introduce PLD approach to modify crystalline structures of Er2SiO5 crystal and the related materials. Here we focus on formation of Er2SiO5/Si stacked structure toward light emitting devices (LEDs) and formation of ErxY2-xSiO5 systems to reduce upconversion effectively.
Keywords :
crystals; erbium compounds; laser materials processing; light emitting devices; pulsed laser deposition; silicon compounds; Er2SiO5; LED; light emitting devices; modify crystalline structures; pulsed laser deposition; waveguide amplifiers; Crystalline materials; Crystallization; Erbium; Optical materials; Optical pulses; Photonic crystals; Pulse amplifiers; Pulsed laser deposition; Silicon; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location :
San Francisco, CA
ISSN :
1949-2081
Print_ISBN :
978-1-4244-4402-1
Electronic_ISBN :
1949-2081
Type :
conf
DOI :
10.1109/GROUP4.2009.5338323
Filename :
5338323
Link To Document :
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