DocumentCode
2472113
Title
Approach to modify crystalline structures of Er2 SiO5 by pulsed laser deposition
Author
Tanaka, Y. ; Kimura, T. ; Isshiki, H.
Author_Institution
Dept. of Electron. Eng., Univ. of Electro-Commun., Chofu, Japan
fYear
2009
fDate
9-11 Sept. 2009
Firstpage
184
Lastpage
186
Abstract
Er2SiO5 crystal shows strong and sharp Er-related PL emissions at room temperature. It is expected as a basic material of waveguide amplifiers in silicon photonics. Recently we have proposed Er2SiO5 crystal preparation by Pulsed Laser Deposition (PLD) method for device applications. In this paper we introduce PLD approach to modify crystalline structures of Er2SiO5 crystal and the related materials. Here we focus on formation of Er2SiO5/Si stacked structure toward light emitting devices (LEDs) and formation of ErxY2-xSiO5 systems to reduce upconversion effectively.
Keywords
crystals; erbium compounds; laser materials processing; light emitting devices; pulsed laser deposition; silicon compounds; Er2SiO5; LED; light emitting devices; modify crystalline structures; pulsed laser deposition; waveguide amplifiers; Crystalline materials; Crystallization; Erbium; Optical materials; Optical pulses; Photonic crystals; Pulse amplifiers; Pulsed laser deposition; Silicon; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
1949-2081
Print_ISBN
978-1-4244-4402-1
Electronic_ISBN
1949-2081
Type
conf
DOI
10.1109/GROUP4.2009.5338323
Filename
5338323
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