CMOS compatible silicon etched V-grooves integrated with a SOI fiber coupling technique for enhancing fiber-to-chip alignment

Author

Galan, J.V. ; Sanchis, P. ; Martí, J. ; Marx, S. ; Schröder, H. ; Mukhopadhyay, B. ; Tekin, T. ; Selvaraja, S. ; Bogaerts, W. ; Dumon, P. ; Zimmermann, L.

Author_Institution

Nanophotonics Technol. Center, Univ. Politec. Valencia, Valencia, Spain

fYear

2009

fDate

9-11 Sept. 2009

Firstpage

148

Lastpage

150

Abstract

Integration of a polarization insensitive inverted taper-based fiber coupling structure with silicon etched V-grooves is demonstrated in CMOS silicon photonics. Coupling loss of 7.5 dB are measured at lambda=1.55 mum. A spectrum broader than 70 nm is observed.

Keywords

CMOS integrated circuits; elemental semiconductors; etching; integrated optics; optical fibre couplers; optical fibre losses; optical fibre testing; silicon; CMOS compatible silicon etched V-grooves; CMOS silicon photonics; SOI fiber coupling; Si; coupling loss; fiber coupling structure integration; fiber-to-chip alignment; loss 7.5 dB; polarization insensitive inverted taper-based fiber coupling; wavelength 1.55 mum; Coupling circuits; Etching; Optical coupling; Optical fiber couplers; Optical fiber polarization; Optical fibers; Optical losses; Optical waveguides; Photonics; Silicon on insulator technology;

fLanguage

English

Publisher

ieee

Conference_Titel

Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on

Conference_Location

San Francisco, CA

ISSN

1949-2081

Print_ISBN

978-1-4244-4402-1

Electronic_ISBN

1949-2081

Type

conf

DOI

10.1109/GROUP4.2009.5338334

Filename

5338334