Title :
Correction of iso-focal tilt in phase edge lithography by adjustment of primary spherical aberration
Author :
Nakao, S. ; Tsujita, K. ; Arimoto, I. ; Wakamiya, W.
Author_Institution :
ULSI Dev. Center, Mitsubishi Electr. Corp., Hyogo, Japan
Abstract :
It is revealed by optical image calculations that iso-focal tilt in phase edge lithography can be corrected by adjustment of primary spherical aberration. Tolerant range of the adjustment is /spl sim/0.02 wave. Moreover, DOF becomes larger than that in ideal optics under corrected spherical aberrations with large RMS-OPD of /spl sim/0.66 wave.
Keywords :
aberrations; phase shifting masks; photolithography; iso-focal tilt correction; optical image calculations; phase edge lithography; primary spherical aberration; Focusing; Image analysis; Lenses; Lighting; Lithography; Optical distortion; Optical filters; Optical imaging; Printing; Ultra large scale integration;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872611
