High-temperature superconducting oxide films

Author

Hong, M. ; Kwo, J. ; Chen, C.H.

Author_Institution

AT&T Bell Lab., Murray Hill, NJ, USA

fYear

1988

fDate

9-11 May 1988

Firstpage

146

Lastpage

151

Abstract

Sputter deposition has been used with single-oxide targets and metal molecular beam epitaxy to prepare thin films of the high-T/sub c/ oxide Y-Ba-Cu-O superconductor. The processing parameters, the structural characteristics and the transport properties of the films are reported. The microstructures of superconducting Y/sub 1/Ba/sub 2/Cu/sub 3/O/sub 7/ thin films epitaxially grown on SrTiO/sub 3/

Keywords

high-temperature superconductors; molecular beam epitaxial growth; sputter deposition; strontium compounds; substrates; yttrium compounds; MBE; SrTiO/sub 3/; YBa/sub 2/Cu/sub 3/O/sub 7/-SrTiO/sub 3/; density of twin boundaries; high critical current density; high temperature superconducting films; metal molecular beam epitaxy; microstructures; processing parameters; sputter deposition; structural characteristics; thin-film samples; transport properties; Critical current density; High temperature superconductors; Microstructure; Molecular beam epitaxial growth; Sputtering; Substrates; Superconducting epitaxial layers; Superconducting films; Superconducting thin films; Yttrium barium copper oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Components Conference, 1988., Proceedings of the 38th

Conference_Location

Los Angeles, CA, USA

Type

conf

DOI

10.1109/ECC.1988.12586

Filename

12586