DocumentCode
2472384
Title
Influence of CARS process in silicon Raman laser
Author
Huang, Ying ; Tang, Ming ; Shum, Ping ; Lin, Chinlon
Author_Institution
Dept. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
fYear
2009
fDate
9-11 Sept. 2009
Firstpage
113
Lastpage
115
Abstract
We investigated the coherent anti-Stokes Raman scattering (CARS) process in silicon Raman laser through a two-model approach. Significant output enhancement and threshold reduction could be obtained simultaneously with a phase-matched silicon waveguide cavity. End-facet reflectivity analysis is also explored to obtain output maximization configuration.
Keywords
Raman lasers; coherent antiStokes Raman scattering; elemental semiconductors; laser cavity resonators; optical phase matching; optimisation; reflectivity; semiconductor device models; semiconductor lasers; silicon; waveguide lasers; CARS process; Si; coherent anti-Stokes Raman scattering; end-facet reflectivity analysis; output enhancement; output maximization configuration; phase-matched silicon waveguide cavity; silicon Raman laser; threshold reduction; two-model approach; Fiber lasers; Laser excitation; Laser modes; Laser tuning; Pump lasers; Raman scattering; Reflectivity; Silicon; Stimulated emission; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2009. GFP '09. 6th IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
1949-2081
Print_ISBN
978-1-4244-4402-1
Electronic_ISBN
1949-2081
Type
conf
DOI
10.1109/GROUP4.2009.5338339
Filename
5338339
Link To Document