Title :
Reliability modeling and management in dynamic microprocessor-based systems
Author :
Karl, Eric ; Blaauw, David ; Sylvester, Dennis ; Mudge, Trevor
Author_Institution :
Michigan Univ., Ann Arbor, MI
Abstract :
Reliability failure mechanisms, such as time dependent dielectric breakdown, electromigration, and thermal cycling have become a key concern in processor design. The traditional approach to reliability qualification assumes that the processor operates at maximum performance continuously under worst case voltage and temperature conditions. However, the typical processor spends a very small fraction of its operational time at maximum voltage and temperature. In this paper, we show how this results in a reliability "slack" that can be leveraged to provide increased performance during periods of peak processor demand. We develop a real time reliability model based on workload driven conditions. We then propose a new dynamic reliability management (DRM) scheme that results in 20-35% performance improvement during periods of peak computational demand while ensuring the required reliability lifetime
Keywords :
integrated circuit modelling; integrated circuit reliability; microprocessor chips; dielectric breakdown; dynamic microprocessor; dynamic reliability management; electromigration problem; reliability modeling; thermal cycling; Breakdown voltage; Dielectric breakdown; Dynamic voltage scaling; Electromigration; Failure analysis; Project management; Qualifications; Thermal degradation; Thermal management; Voltage control; Design; Dynamic Reliability Management; Electromigration; Management; Modeling; Oxide Breakdown; Performance; Reliability; Thermal Cycling;
Conference_Titel :
Design Automation Conference, 2006 43rd ACM/IEEE
Conference_Location :
San Francisco, CA
Print_ISBN :
1-59593-381-6
DOI :
10.1109/DAC.2006.229438