DocumentCode
2472499
Title
A new cleaning technique for x-ray masks in alkaline solutions by control of surface potential
Author
Tuda, Mutumi ; Kinugawa, Masaru ; Ootera, Hiroki ; Marumoto, Kenji
Author_Institution
Adv. Technol. R&D Center, Mitsubishi Electr. Corp., Hyogo, Japan
fYear
2000
fDate
11-13 July 2000
Firstpage
54
Lastpage
55
Abstract
This paper presents an electrochemical surface cleaning (ECSC) technique for x-ray masks employing amorphous WN/sub x/ absorbers. The electrostatic surface potential of the mask in alkaline solutions is precisely controlled for preventing from corrosion or etching of absorber films during cleaning, thus leading to almost no change in pattern dimension and film stress between before and after cleaning.
Keywords
X-ray masks; surface cleaning; surface potential; tungsten compounds; WN; X-ray mask; alkaline solution; amorphous WN/sub x/ absorber; electrochemical surface cleaning; surface potential; Amorphous materials; Corrosion; Counting circuits; Electrodes; Etching; Stress; Substrates; Surface cleaning; Surface contamination; Tungsten;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-004-6
Type
conf
DOI
10.1109/IMNC.2000.872619
Filename
872619
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