Title :
Point injection in trench insulated gate bipolar transistor for ultra low losses
Author :
Antoniou, M. ; Udrea, F. ; Bauer, F. ; Mihaila, A. ; Nistor, I.
Author_Institution :
Dept. of Eng., Univ. of Cambridge, Cambridge, UK
Abstract :
In this paper we propose novel designs that enhance the plasma concentration across the Field Stop IGBT. The “p-ring” and the “point-injection” type devices exhibit increased cathode side conductivity modulation which results in impressive IGBT performance improvement. These designs are shown to be extremely effective in lowering the on-state losses without compromising the switching performance or the breakdown rating. For the same switching losses we can achieve more than 20% reduction of the on state energy losses compared to the conventional FS IGBT.
Keywords :
insulated gate bipolar transistors; losses; power semiconductor switches; cathode side conductivity modulation; field stop IGBT; p-ring type device; plasma concentration; point injection; point-injection type device; switching loss; trench insulated gate bipolar transistor; Anodes; Cathodes; Insulated gate bipolar transistors; Logic gates; Performance evaluation; Plasmas; Power semiconductor devices; Field Stop; Insulated Gate Bipolar Transistor; Point Injection; Soft Punch Through;
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location :
Bruges
Print_ISBN :
978-1-4577-1594-5
Electronic_ISBN :
1943-653X
DOI :
10.1109/ISPSD.2012.6229013