DocumentCode :
2473096
Title :
EB stepper. A high throughput E-beam projection lithography system
Author :
Yamaguchi, T.
Author_Institution :
Div. IC Equipment, Nikon Corp., Tokyo, Japan
fYear :
2000
fDate :
11-13 July 2000
Firstpage :
116
Lastpage :
117
Abstract :
The author reviews progress in electron beam projection lithography. He discusses the management of 250 /spl mu/m sub-field distortion correction and EB tool design.
Keywords :
electron beam lithography; E-beam projection lithography; stepper; sub-field distortion correction; tool design; Electrons; Lenses; Lithography; Optical design; Optical distortion; Optical feedback; Optical interferometry; Optical scattering; Page description languages; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
Type :
conf
DOI :
10.1109/IMNC.2000.872650
Filename :
872650
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2473096
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