DocumentCode
2473808
Title
Silicon oxynitride in integrated optics
Author
Wörhoff, Kerstin ; De Ridder, René M. ; Lambeck, Paul V. ; Driessen, Alfred
Author_Institution
MESA Res. Inst., Twente Univ., Enschede, Netherlands
Volume
2
fYear
1998
fDate
3-4 Dec 1998
Firstpage
370
Abstract
A review on the state of the art of silicon oxynitride deposition at the MESA Research Institute will be given. The recent progress in the application of silicon oxynitride in communication devices will be discussed
Keywords
integrated optics; optical communication equipment; optical fabrication; silicon compounds; MESA Research Institute; communication devices; integrated optics; silicon oxynitride; silicon oxynitride deposition; state of the art; Chemical vapor deposition; Integrated optics; Optical fiber devices; Optical fiber losses; Optical fiber polarization; Optical waveguides; Plasma chemistry; Plasma temperature; Refractive index; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location
Orlando, FL
Print_ISBN
0-7803-4947-4
Type
conf
DOI
10.1109/LEOS.1998.739716
Filename
739716
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