Title :
Mechanisms responsible for dynamic ON-resistance in GaN high-voltage HEMTs
Author :
Jin, Donghyun ; Alamo, Jesús A del
Author_Institution :
Electr. Eng. & Comput. Sci., Massachusetts Inst. of Technol., Cambridge, MA, USA
Abstract :
We have developed a new methodology to study the dynamic ON-resistance (RON) of high-voltage GaN High-Electron-Mobility Transistors (HEMTs). With this technique, we have investigated dynamic RON transients over a time span of 11 decades. In OFF to ON time transients, we observe a fast release of trapped electrons through a temperature-independent tunneling process. We attribute this to border traps at the AlGaN barrier/AlN spacer interface. Over a longer time scale, we observe conventional thermally activated electron detrapping from traps at the surface of the device or inside the AlGaN barrier. These findings provide a path for power switching device engineering with minimum dynamic RON.
Keywords :
II-VI semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; wide band gap semiconductors; AlGaN-AlN; GaN; dynamic ON-resistance; high-voltage HEMT; high-voltage high-electron- mobility transistors; off time transients; on time transients; power switching device engineering; temperature-independent tunneling process; thermally activated electron detrapping; Aluminum gallium nitride; Electron traps; Gallium nitride; HEMTs; MODFETs; Switches; Transient analysis; GaN; HEMT; border traps; dynamic ON-resistance;
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2012 24th International Symposium on
Conference_Location :
Bruges
Print_ISBN :
978-1-4577-1594-5
Electronic_ISBN :
1943-653X
DOI :
10.1109/ISPSD.2012.6229089