Title :
Status of EUV lithography and plans in USA
Author_Institution :
EUV LLC, Livermore, CA, USA
Abstract :
The major EUV lithography development program in the US is supported by the EUV LLC consortium composed of Advanced Micro Devices, Intel, Micron, and Motorola. The program goal is to facilitate the research, development and engineering to enable the Semiconductor Equipment Manufacturers (SEMs) to provide production quantities of 70 nm EUV lithography tools for IC manufacturing by 2005.
Keywords :
ultraviolet lithography; EUV lithography; IC manufacturing; LLC consortium; USA; semiconductor equipment manufacturers; Defense industry; Laboratories; Lithography; Metrology; Nonhomogeneous media; Optical sensors; Power engineering and energy; Production; Semiconductor device manufacture; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872747
