Title :
Aluminum quantum dots fabrication by nano-imprint lithography
Author :
Hirai, Yoshihiko ; Yoshida, Satoshi ; Okuno, Hiroyuki ; Fujiwara, Masaki ; Tanaka, Yoshio
Author_Institution :
Dept. of Mech. Syst. Eng., Osaka Prefecture Univ., Japan
Abstract :
We have demonstrated the fabrication of Aluminum quantum dots by nano imprint lithography using dimpled mold. We believe that the fabricated structure would be a first step to realize mass production of an ultra large scaled quantum dots memory.
Keywords :
aluminium; lithography; moulding; nanotechnology; quantum dots; Al; aluminum quantum dot; dimpled mold; fabrication; nano-imprint lithography; Aluminum; Etching; Fabrication; Lithography; Logic arrays; Quantum dots; Resists; Single electron devices; Substrates; US Department of Transportation;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-004-6
DOI :
10.1109/IMNC.2000.872769
