DocumentCode
2475010
Title
The performances of the novel nozzle-scan coating method
Author
Ito, S. ; Ema, T. ; Sho, K. ; Okumura, K. ; Kitano, T. ; Esaki, Y. ; Morikawa, M. ; Takeshita, K. ; Akimoto, M.
Author_Institution
Process & Manuf. Eng. Center, Toshiba Corp., Yokohama, Japan
fYear
2000
fDate
11-13 July 2000
Firstpage
298
Lastpage
299
Abstract
A novel nozzle-scan coating (NS-coating) method is useful for reducing the coated volume and its cost. We define the (waste-fluid rate) WFR as the ratio of the waste fluid to the fluid supplied on the wafer. In conventional spin-coating, the WFR is about 1500%. In the case of the extrusion-spin coating, the WFR decreases to 203%. But using the NS-coating with low speed and large acceleration, the WFR of the raw materials drastically decreased to 30%. This paper introduces some lithographic performances of NS-coating film of KrF chemical amplified resist that was coated with low WFR condition.
Keywords
nozzles; photoresists; spin coating; KrF lithography; chemical amplified resist; nozzle-scan coating; spin coating; waste fluid rate; Acceleration; Chemicals; Coatings; Electrons; Indium tin oxide; Manufacturing processes; Raw materials; Research and development; Resists; Solvents;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2000 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-004-6
Type
conf
DOI
10.1109/IMNC.2000.872774
Filename
872774
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