• DocumentCode
    2475304
  • Title

    A systematic methodology to improve yield per area of highly-parallel CMPs

  • Author

    Cheng, Da ; Gupta, Sandeep K.

  • Author_Institution
    Univ. of Southern California, Los Angeles, CA, USA
  • fYear
    2012
  • fDate
    3-5 Oct. 2012
  • Firstpage
    126
  • Lastpage
    133
  • Abstract
    Manufacturing yield of chip multi-processors (CMPs) has become a significant problem as more transistors are integrated onto a single die, and the defect rate keeps increasing for "end-of-Moore" nano-scale CMOS technologies. Since such CMP designs usually have significant structural symmetry, adding spares to these should be an effective method for increasing yield per area, as is the case for memories. However, a systematic approach to add spares to optimize CMP yield per area has never been developed, primarily due to the lack of (i) a general model of CMP architectures, and (ii) a practically-useable model for computing areas of chip versions with different numbers of spares. This paper develops such models and, in conjunction with a systematic approach for enumerating a wide range of spare configurations, uses these to compute area overhead and yield for each configuration. In particular, this paper proposes a k-way spare sharing technique to obtain optimal spare configurations which maximize yield per area of any CMP by efficiently traversing the design space for adding spares. Experimental results show significant yield per area improvements over the previous approaches and show that these benefits will continue to grow with increase in the levels of parallelism in CMPs as well as with continued technology scaling.
  • Keywords
    CMOS digital integrated circuits; integrated circuit design; microprocessor chips; chip multiprocessors design; continued technology scaling; design space; end-of-Moore; high-parallel CMP; k-way spare sharing technique; manufacturing yield; nanoscale CMOS technologies; structural symmetry; systematic methodology; yield per area improvement; Decision support systems; Discrete Fourier transforms; Fault tolerance; Fault tolerant systems; Nanotechnology; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Defect and Fault Tolerance in VLSI and Nanotechnology Systems (DFT), 2012 IEEE International Symposium on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    978-1-4673-3043-5
  • Type

    conf

  • DOI
    10.1109/DFT.2012.6378212
  • Filename
    6378212