DocumentCode :
2475542
Title :
Design and fabrication of 2-DOF silicon micromirror with sloped electrodes
Author :
Jin, Joo-Young ; Park, Jae-Hyoung ; Yoo, Byung-Wook ; Jang, Yun-Ho ; Kim, Yong-Kweon
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., Seoul, South Korea
fYear :
2009
fDate :
17-20 Aug. 2009
Firstpage :
135
Lastpage :
136
Abstract :
We report on the design, fabrication and experiment of a 2-DOF silicon scanning micromirror. We propose sloped electrodes to increase a maximum scan angle with a simple fabrication process. A delayed electroplating technique is adopted to fabricate the sloped profile of the electrodes over the patterned seed layer. We fabricated the 2-DOF scanning mirror which has different type of electrodes beneath each axis and compared with parallel plate electrodes. Experiment results show sloped electrodes increase stable range up to 62.1% and decreases actuation voltage down to 65.4% from parallel plate electrodes.
Keywords :
electro-optical devices; electroplating; microfabrication; micromirrors; optical design techniques; optical fabrication; silicon; Si; delayed electroplating technique; microfabrication; patterned seed layer; silicon scanning micromirror design; sloped electrodes; Actuators; Analytical models; Delay; Electrodes; Fabrication; Micromirrors; Mirrors; Rotation measurement; Silicon; Voltage; cone-type; electroplating; scanning mirror; sloped electrode; wedge-type;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical MEMS and Nanophotonics, 2009 IEEE/LEOS International Conference on
Conference_Location :
Clearwater, FL
Print_ISBN :
978-1-4244-2382-8
Electronic_ISBN :
978-1-4244-2382-8
Type :
conf
DOI :
10.1109/OMEMS.2009.5338542
Filename :
5338542
Link To Document :
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